Fundamentals: what a GaN HEMT is
The device stack, material advantages, and the engineering knobs that determine performance.
Core definition
Layer-stack picture
Canonical lateral AlGaN/GaN HEMT: the 2DEG sits on the GaN side of the AlGaN/GaN interface; the gate modulates the channel through the barrier.
A GaN HEMT is a field-effect transistor built around a heterojunction, usually AlGaN/GaN, where electrons conduct in a thin sheet at the interface. The channel is called a 2DEG because carriers are confined vertically but free to move laterally from source to drain.
Unlike a silicon MOSFET, the channel is not primarily created by inversion under an oxide. In the canonical GaN HEMT, it is created by polarization charge at the heterointerface.
Typical lateral AlGaN/GaN stack
- Substrate: Si for cost and large wafers, SiC for RF thermal performance, sapphire for some legacy/low-cost uses, bulk GaN or AlN for advanced research.
- Transition/buffer layers: manage lattice/thermal mismatch and isolate the high-voltage device from the substrate.
- GaN channel: hosts the 2DEG on the GaN side of the interface.
- AlGaN barrier: supplies band offset, strain, and polarization discontinuity.
- Optional AlN spacer/back barrier: improves confinement or reduces alloy scattering.
- Gate: Schottky, MIS, p-GaN, recessed MIS, or cascode-controlled depending on application.
- Field plates/passivation: shape electric field and reduce trapping/current collapse.
Why GaN beats silicon in the right regime
GaN’s wide bandgap and high critical field allow a shorter, thinner drift region for a given voltage. Its high electron saturation velocity and low gate charge enable fast switching and RF operation. Those material advantages translate into high power density and high-frequency operation — but only if packaging, thermal paths, and reliability are engineered correctly.
GaN is not automatically better everywhere. It shines at compact, high-frequency conversion and RF power. SiC usually dominates at higher voltage and rugged high-power modules; silicon remains cheaper and simpler for many low-stress designs.